The galvanostatic electrodeposition of manganese dioxide films in the thickness range from 0 to 1000 nm was investigated by in situ ellipsometry. The results obtained can be fit into the whole thickness range in terms of the uniaxial anisotropy of the film. The optical indices and thicknesses were calculated. The anisotropic properties may be related to a preferential orientation of the deposits.
ellipsometry; manganese oxide; anisotropy