NbxAlyNz thin films were deposited by magnetron sputtering reactive technique with (y/x+y) ratio varying from 0 to 0.4, in order to maintain aluminum atoms inside NbN matrix in solid solution. GAXRD analyses revealed that the crystalline phase obtained for NbxAlyNz thin films was B1-NbN with a lattice constant shrinkage as Al concentration at these coatings was increased. Due to similarity in electro negativity values between Nb and Al, XPS analyses could not verify pronounced changes among as deposited NbxAlyNz coatings. The average hardness values evidenced that solid solution strengthening mechanism did not increase hardness significantly. The oxidation resistance increased with Al content and no oxide phases were registered by GAXRD analyses for coating with more aluminum added. However, SEM images revealed bubbles after oxidation at high temperatures for all samples.
Keywords:
thin films; magnetron sputtering; niobium nitride; aluminum nitride; NbAlN; high temperature oxidation
