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Erratum • Mat. Res. 25 • 2022 • https://doi.org/10.1590/1980-5373-MR-2021-0016er   copy
This erratum corrects:

Erratum: Characterization of Plasma-deposited a-C:H:Si:F:N Films

In the article “Characterization of Plasma-deposited a-C:H:Si:F:N Films”, with DOI: https://doi.org/10.1590/1980-5373-MR-2021-0016, published in Materials Research, 24(suppl. 1):e20210016, on page 6, Figs. 11 and 12, should be as shown below:

Figure 11
Example (of the unfluorinated film) of the graph allowing the calculation of the Urbach energy.
Figure 12
Urbach energy as a function of the Tauc gap. The partial pressure of SF6 used for each film deposition is given.

Publication Dates

  • Publication in this collection
    27 June 2022
  • Date of issue
    2022
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