Optoelectronic Properties of Bismuth Sulfide Thin Films Grown by PVD

Abstract

Bismuth (III) sulfide thin films are prepared on glass substrates by physical vapor deposition technique. Then, the films are annealed at different temperatures from 150 to 350°C with nitrogen and nitrogen-sulfur atmospheres, respectively. The effect of annealing temperature on the optoelectronic properties is investigated. The layers were characterized using ultraviolet-visible spectroscopy, XRD, Raman spectroscopy, EDS analysis and Hall effect. The film annealed at 250°C in a nitrogen-sulfur atmosphere exhibited the best condition with an initial thickness of 106 nm and band gap of 1.37 eV. Also, Bismuthinite phase was obtained, close to the stoichiometry with 59.95 and 40.05 at % for bismuth and sulfur, respectively. The charge carrier concentration of 6.9x10¹⁹ cm^-3 with a n-type conductivity, the resistivity of 0.19 Ω-cm, and mobility of 0.44 cm²V^-1s^-1 are obtained.

Keywords:
Bismuth sulfide; Physical vapor deposition; Thermal Annealed; Optoelectronic Properties