Oxide Layers Growth on AISI 1006 Steel through 'Asymmetric Bipolar Pulsed Plasma' Process

Fin, Paula; Recco, Abel A. C.; Scholtz, Juliano Sadi; Fontana, Luis C.

doi:10.1590/1980-5373-MR-2021-0475

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Article • Mat. Res. 25 • 2022 • https://doi.org/10.1590/1980-5373-MR-2021-0475 copy

Oxide Layers Growth on AISI 1006 Steel through 'Asymmetric Bipolar Pulsed Plasma' Process

Authorship SCIMAGO INSTITUTIONS RANKINGS

Abstract

The main problem in metal oxidation is the spalling and de-cohesion of the oxide layer, which results in delamination due to strong compressive stress gradient through the layer. Present paper proposes the use of a modified process named Asymmetric Bipolar Pulsed Plasma (ABiPPS) for plasma-oxidation treatment of low carbon steel AISI-1006 samples. Results show that the ABiPPS process ensures high plasma stability and enables the growth of uniform oxide layers (with thickness up to 6 µm) on metal surfaces. Plasma generated through bipolar asymmetric voltage pulses provides better control on surface bombardment through interspersed jets of ions and electrons, during the oxidation process. The control of intermittent ions and electrons bombardment (through voltage peaks up to 1.5 kV and period about 1µs), during plasma oxidation, make it possible to improve the adhesion between the oxide layer and the substrate, moreover the control of crystalline phases, such as hematite and magnetite.

Keywords:
oxide layer ; asymmetric bipolar pulsed plasma ABiPPS; ion and electron bombardment

Sample name	Treatment Time (h)	Temp. (°C)	ABiPPS parameters					Resulting oxide layer (thickness)
			Voltage peaks (V)			Peak Period (µs)
			-Vsn	-Vln	+Vsp	τs	τl
O300-0.5	0.5	300	1000	360	600	1.0	10.0	>0.2 µm
O300-2	2.0	300	1000	360	600	1.0	10.0	1.0±0.2 µm
O500-0.5	0.5	500	1350	500	600	1.0	10.0	6.0±0.2 µm
O500-2	2.0	500	1350	500	600	1.0	10.0	spalling layer

Oxide/ Hardness (GPa)	Fe₂O₃	Fe₃O₄
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