ABSTRACT
The coating process using magnetron sputtering technique is widely used to create metal and ceramic coatings, due to the versatility on the control of the properties just adjusting few variables of process. Therefore, the properties of metallic coatings, which are connected with the crystalline structure and chemical composition, can be controlled, so the process could be used in a lot of areas of interest. Thin films were deposited using a stainless steel AISI 316 target in four different power densities applied to the cathode and in three different N2 percentages in the work atmosphere. The objective is to understand the influence of these parameters on phase stabilizing of alpha and gamma that have body centered cubic (BCC) and face centered cubic (FCC), respectively. The deposited thin film was characterized by X-ray diffraction, thickness, hardness and Young’s modulus. The results shown that changing the density power applied to the target result in thin films with CCC structure, hardness and Young’s modulus of 10,0 GPa and 210 GPa, respectively. Changing the percentage of N2 on the work atmosphere the thin films grow with alpha and gamma phase with hardness and Young’s modulus of 7,5 GPa and 166 GPa, respectively.
Keywords
thin films; magnetron sputtering; AISI 316 stainless steel; surface; plasma
