ABSTRACT
Ti-6Al-4V was plasma nitrided using several N2/H2 ratios and substrate temperatures. In order to investigate the combined influence of these parameters on phase composition and thickness of the coatings, the phases in the as received, annealed, and nitrided Ti-6Al-4V samples were identified with Rietveld refinement. In the as-received and annealed samples the structure parameters of α-Ti and β-Ti were slightly changed, due to the substitution of titanium atoms by Al or V in the α-and β-Ti unit cells. A combination of multiple angle grazing incidence X-ray diffraction, nuclear reaction analysis and cross sectional micrographs showed compound layers consisting of an outer layer of stoichiometric ẟ-TiN over a phase mixture of ẟ-TiN and ɛ-Ti2N, formed on top of a nitrogen diffusion region in the alloy. Higher nitriding temperatures induced thicker compound layers, and higher nitrogen content of the plasma induced thicker fine-grained ẟ-TiN top layers.
Keywords
plasma nitriding; Ti-6Al-4V; titanium nitride; Rietveld analysis
